The National Third-Generation Semiconductor Conference Opens in Suzhou Nano City.
On October 22, 2024, the 2024 National Third-Generation Semiconductor Conference, hosted by Today Semiconductor, was grandly opened in Suzhou Nano City. The conference drew numerous industry elites and corporate representatives, creating a vibrant and unprecedentedly enthusiastic atmosphere. As an industry leader, Pengcheng Semiconductor showcased its PVD coating equipment, HFCVD hot-filament chemical vapor deposition equipment, molecular beam epitaxy (MBE) systems, plasma-enhanced chemical vapor deposition (PECVD) equipment, and related solutions at this conference, attracting the attention of industry professionals and experts from across the country and becoming one of the event’s major highlights.
2024/10/23
In Wuhan during the golden autumn month of October, a grand event bringing together top expertise from across China and around the globe in the field of new materials—the 5th China New Materials Industry Development Conference—is about to kick off. The conference will be held from October 16 to 18, 2024, at the China Car Valley International Sports and Cultural Exchange Center in the Economic Development Zone of Wuhan, Hubei Province. Organized by the Chinese Society for Materials Research, the conference has attracted numerous leading figures from the new materials industry. Among them, Pengcheng Semiconductor Technology (Shenzhen) Co., Ltd. (referred to as “Pengcheng Semiconductor”), a prominent player in the industry, will make an appearance at the conference to showcase its latest achievements and technological innovations in the semiconductor sector.
2024/10/15
Features and Functional Advantages of Plasma Coating Equipment
A plasma coating system is a surface treatment equipment with a wide range of applications and significant functional advantages. It is primarily used for surface coating and modification. By exposing materials to a plasma environment, this technology leverages ion bombardment and reactive deposition mechanisms to modify and coat material surfaces. This technology finds extensive applications across various industries, including electronics, optoelectronics, medical devices, automotive, and others.
2024/08/12
Applications and Precautions for Magnetron Sputtering Coating Equipment
The magnetron sputtering coating system (PVD coating equipment) is a commonly used surface-coating device. It employs evaporation or sputtering under vacuum conditions to deposit thin films onto substrate surfaces, enabling the preparation of metal, alloy, compound, semiconductor, ceramic, dielectric composite films, and other chemically reactive films. This technique is suitable for depositing various single-layer films, multilayer films, doped films, and alloy films, and can be used to coat both magnetic and non-magnetic materials. It finds extensive applications in industries such as electronics, optoelectronics, optics, and medical devices. To ensure proper operation and achieve excellent coating results, the following are some key details and tips to keep in mind when using a magnetron sputtering coating system.
2024/07/29
As a semiconductor material with an ultra-wide bandgap, diamond boasts exceptional physical properties, including high carrier mobility, high thermal conductivity, high breakdown electric field, high carrier saturation velocity, and low dielectric constant. It is widely regarded as the “ultimate semiconductor” for fabricating next-generation electronic devices that feature high power, high frequency, high temperature resistance, and low power loss.
2024/07/22
Definition and Function of a Magnetron Sputtering Coating System
The magnetron sputtering coating system (PVD coating equipment) is an advanced surface treatment device characterized by its high efficiency. By using a magnetic field to control the trajectory of the ion beam, it achieves sputter deposition onto material surfaces, thereby producing high-quality thin-film coatings. The primary function of the magnetron sputtering coating system is to form uniform, dense, and well-adhered thin film layers on various material surfaces, enhancing the materials' hardness, wear resistance, and corrosion resistance. At the same time, this technology can also be used to modify the optical, electrical, and thermal properties of materials, meeting the diverse requirements of different application fields.
2024/07/17
Diamond is a prototypical multifunctional extreme material with outstanding performance in electrical, optical, thermal, mechanical, acoustic, and electrochemical fields, and it holds great promise for applications in numerous high-tech industries.
2024/07/09
Application of PVD Technology in Semiconductor Devices
In the rapidly evolving field of semiconductor technology, physical vapor deposition (PVD) is a critical tool for achieving precision and efficiency in thin-film deposition processes. Let’s explore together the advanced applications of PVD technology in the semiconductor industry.
2024/07/04
Shenzhen CVD Diamond Film Technology [Taifeng News]
Due to their outstanding performance and broad application prospects, CVD diamond film technology has already been applied in many fields. In the future, as the technology continues to advance and performance keeps improving, CVD diamond films will have even greater application potential in the following areas:
2024/04/22
Industry Analysis of PVD Vacuum Coating Equipment
In 2024, the global PVD vacuum coating equipment industry had a total market size of approximately US$2.2 billion, and this figure is expected to double by 2024, reaching US$4.7 billion. PVD vacuum coating technology uses non-metallic materials under vacuum conditions and employs charged-ion collision techniques to form thick films. This technology boasts advantages such as high polymerization degree, strong adhesion, high transparency, and excellent corrosion resistance.
2024/03/04