Vacuum High-Temperature CVD Furnace
The vacuum high-temperature CVD furnace employs high-temperature chemical vapor deposition to deposit various thin films onto the surface of workpieces. It is widely used in the semiconductor industry, including the deposition of large-area insulating materials as well as most metallic materials and metal alloy materials, such as tantalum carbide coatings and silicon carbide coating materials.
- Product Description
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Vacuum High-Temperature CVD Furnace The high-temperature chemical vapor deposition method is widely used in the semiconductor industry to deposit various thin films on the surface of workpieces. This method is particularly suitable for depositing large-area insulating materials as well as most metallic materials and metal alloy materials, such as tantalum carbide coatings and silicon carbide coating materials.
For example, tantalum carbide and silicon carbide coatings can be deposited on the surface of graphite workpieces.
Suitable for manufacturing enterprises, materials laboratories at major universities, research institutes, environmental science, and other related fields.
Device Composition
The furnace shell is made of stainless steel and features a double-layer water-cooling structure. It is equipped with an observation window, an infrared temperature-measuring window, and a thermocouple temperature-measuring device.
Heating system
A heater is installed inside the equipment to create a thermal field for thin-film deposition.
Sample Stage System
The sample stage can simultaneously hold multiple workpieces.
Temperature Measurement and Heating Power Supply
1. Temperature control and measurement are all performed using thermocouples/tungsten-rhenium thermocouples/infrared pyrometers.
2. The power of the heating power supply shall be customized according to actual requirements.
Main technical specificationsType Parameter Power Approximately 150 kW Heater operating temperature ≤2200℃ Vacuum degree 6.67 × 10 -3 Pa (cold-state no-load) Boost ratio 0.08pa/h
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